Boron–oxygen-related degradation in multicrystalline silicon wafers

Published: May 1, 2015

By Rune Søndenå, Institute for Energy Technology, Kjeller, Norway

Extended crystal defects, such as grain boundaries and dislocations, have long been considered the main factors limiting the performance of multicrystalline (mc-Si) silicon solar cells. However, because the detrimental effects of these crystal defects are reduced as a result of improvements in the solidification process as well as in the feedstock and crucible quality, the degradation caused by boron–oxygen complexes is expected to be of increasing importance. Light-induced degradation (LID) occurs in both p- and n-type crystalline silicon solar cells that contain both boron and oxygen. Because of the fundamental differences in the solidification processes, mc-Si silicon contains less oxygen than Czochralski silicon; nevertheless, the oxygen content in mc-Si silicon is still sufficient to cause degradation, although to a lesser extent than in the case of Czochralski silicon. Whereas B–O-related degradation of 0.5 to 1% abs. can be found in Czochralski cells, the degradation in conventional mc-Si cells is limited to around 0.1 to 0.2% abs.

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